化學清洗/顯影/蝕刻台

Equipment Name: Wet Bench

Model number: WBS

We accept all types of customized system order

Manual、Semi-automatic、Full-automatic Wet Benches

Hot N2櫃

Equipment Name: Hot N2 Drying system

Model number : HNS-N2

System dimension:474x370x938/mm
Substrate range:2-6 wafer
Housing:PP
Control system:PLC
ELCB (Earth Leakage Circuit Break) electricity protecting device
HEATER:Over heating interlock
Substrate drying time:About 3~5minutes
NO water mark after cleaning
Extremely low wafer breakage rate.
Module design, can be integrate several unit in same system
Easy maintenance