Q&A

Index > Q&A

Frequently Asked Questions

Lamp
Lamp
Recommended usage:
200W, 350W and 500W lamp for 600 hours 1000W and 2000W lamp for 800 hours

There are several kinds of optical components, and most are coated with the unique optical coating. The coating would be consumed because of the using time, temperature, humidity and PH value. We advise you check and record the functionality and appearance constantly. Whenever you have any question, please consult our professional team.

PLC & HMI

A programmable logic controller, PLC, or programmable controller is a digital computer used for automation of typically industrial electromechanical processes, such as control of machinery on factory assembly lines, amusement rides, or light fixtures. PLCs are used in many machines, in many industries. PLCs are designed for multiple arrangements of digital and analog inputs and outputs, extended temperature ranges, immunity to electrical noise, and resistance to vibration and impact.

The Human Machine Interface (HMI) includes the electronics required to signal and control the state of industrial automation equipment. These interface products can range from a basic LED status indicator to a 20-inch TFT panel with touchscreen interface. HMI applications require mechanical robustness and resistance to water, dust, moisture, a wide range of temperatures, and, in some environments, secure communication.

Lithography equipment application

Application:

  • Displays (Touch Panel, LCD, OLED)
  • MEMS devices
  • Optoelectronic devices (LEDs, laser-diodes, waveguide arrays, Ink Jet head, MMIC)
  • Detectors (CCD, near- and far-IR)
  • Passive Component
  • PV ( 3,5 Photo Voltaic)
  • Semiconductor packaging (wafer bumping and wafer-level Packaging)

Process of Photo lithography:

  1. Coaters
    1-1 Spin wash
    1-2 Dehydration drying
    1-3 Photoresist coating
    1-4 Soft baking
  2. Exposure
    2-1 Alignment and Exposure
  3. Developing
    3-1 Developing
    3-2 Pattern confirm
    3-3 Hard baking
  4. Etching
    4-1 Etching
What is Lithography area
Most of the range of light-sensitive photoresist is in the 450nm or less. As long as using 500nm or more of light source, It won’t cause an early photosensitivity and wrong exposure situation. Therefore, we select yellow light source to be the main illumination in the lithography area.
Photo Mask

Definition:

Photo Mask is a sort of glass or film painted specific patterns. The glass is translucent, and some place contained the opaque materials so that light can’t penetrate.

Category:

Glass photo mask : Glass substrates are broadly divided into quartz and soda lime. The better transmittance and the smaller thermal expansion rate goes with quartz material.
Film photo mask : Film photo mask is generally used in the PCB or less precise process of manufacturing. According to the photosensitive materials, the film photo mask can be classified into emulsion film or a substrate coated on the emulsion. However, it’s easy to be scratched and much cheaper. Chrome photo mask: Plated chromium metal on a substrate and then coated with photoresist makes the photo mask hard to scratch and cost much higher.
Size : It could be ranges from 3 to 32 inches, or made of a special size as request as well.

Application :

Photo mask is used in the manufacturing process of semiconductor industry. The manufacturing process of the semiconductor and the wafer is constituted by several processes, repeatedly lithography, etching, film, diffusion and ion implantation. Photo mask is used in the Photolithography. The wafer is coated with a layer of fixed thickness photoresist before entering an exposure machine proceeding to an exposure process. Reproduce the pattern from the photo mask to the wafer and then goes through an exposing and developing step to complete lithography process. Finally, after etching and removing the photoresist, we’ll get the desired pattern.

Formed :

The manufacture of photo mask is using different levels of laser plotters. Manufacturing time varies depending on accuracy. The photo mask production processes include laser drawing, coating with the photosensitive matter. Effect of polymerization or decomposition occurs after laser irradiation. Desired patterns remain on the substrate, and the pattern will be produced after removing the unwanted photoresist. Finally, the photo mask production is completed after a spin washing.
Illuminometer

Principle and application

Illuminometer and Ultraviolet radiation illuminometer belong to the optical test instruments. Illuminometer (or lux meter) is a specialized measuring luminosity, brightness instruments. It could measure the light intensity (illuminance) and the degree of the object to be illuminated.

Test principle of illuminometer:

In photometry, illuminance is the total luminous flux incident on a surface, per unit area. It is a measure of how much the incident light illuminates the surface, wavelength-weighted by the luminosity function to correlate with human brightness perception. Similarly, luminous emittance is the luminous flux per unit area emitted from a surface. Luminous emittance is also known as luminous exitance

Structure

The illuminometer is constructed by a probe and a reading monitor, and the level of luminance is related to the incident angle of the light source. The same token, the angle between the sensor and the light source would make an impact on the readings when you measure with a illuminometer. Therefore, a good illuminometer cosine compensation function can’t be ignored.

The calibration method:

Although different from the calibration test, but the staff should also be calibrated through effective assessment, and obtain the corresponding certificates, only certified personnel side stay issued calibration certificates and calibration reports, only such a certificate and report only considered effective . Calibration can find a place to measure the calibration unit or a third party, provided that both have to have a national award CNAS metering qualifications
Alignment
“Alignment”is simply align the pattern from photomask to the substrate or a wafer. The aligning system is one of the most important part of the Mask aligner. With adjusting the relative position of the X, Y, Z and θ-axis, the system could make fine adjustments between the photomask and the wafer. We provide manual alignment with the micrometer or automatic alignment with using the precise CCD image recognition system. And the resolution up to 1 μm.

UV lamp attenuation
  1. Check the UV lamp power, voltage and current. Make sure they are correct (standard values refer to lamp package).
  2. Make sure to put the UV lamp in the optimal position.
  3. Reflect bowl is oxidized.
  4. Check whether the Fly eye is atomized.
  5. Confirm the lamps completeness.
  6. Check the illuminometer.