Name of patent:Pre-positioning device
Applied country:Republic of China (Taiwan)
Certificate No:M439541

Name of patent: Alignment adjustment device for exposure machine
Applied country:Republic of China (Taiwan)
Certificate No:M439825

Name of patent : Dual-rail circulation type exposure apparatus
Applied country:Republic of China (Taiwan)
Certificate No:M473537

Name of patent : Exposure device with rotary reflection portion
Applied country:Republic of China (Taiwan)
Certificate No:M478177

Patent:

  • Double panel with precise alignment tag and image processing design and method (Taiwan patent, MIRDC)
  • Dual-rail circulation type exposure apparatus (Taiwan patent)
  • Exposure device with rotary reflection portion (Taiwan patent)
  • Alignment adjustment device for exposure machine(Taiwan patent)
  • Pre-positioning device (Taiwan patent)

Key Technique:

  • Machine with the alignment device
  • Precise alignment of image processing design and method