Semi Spin Coater
Semi Spin Coater
Product Number: AGS01A04A
Semi Spin Coater
Equipment:
Applications: Suitable Substrate Size: 2 "-6" round Wafer substrate
Specifications:
- Material: Body panels combine to light material made of SUS 304
- Equipment Frame: Frame paint combinations, solid structure
- Cup: PP system Cup, three-tier structure cup
- Chuck: Anodized aluminum sucker with anti-acid functional, flat surface sucker
- Exhaust system: Three-piece cup cover indirect ventilation design, effectively stabilizing air spoiler, and at the same time reducing residual odor can avoid the back of the photoresist.
- Drain system
- Motor: AC Servo Motor (speed: 10 ~ 6000 RPM)
- Vacuum Pump: Oil-free medium-sized vacuum pressure pump
- Safety device
- Control system: Software & PLC
- Control panel: Color Touch Screen, PLC interface integrated HMI
- Recipe : 30 set.
- Step: One recipe can set 30 step
- Password setting: According to the permissions set password protection
Operating Procedures: Place the wafer in the center of the chuck -> Start -> Vacuum -> Substrate adsorbed on the
turntable -> Rotate ON -> Low speed -> Medium speed -> High speed ->Rotation stops -> Breaking vacuum - > Manual pickup
Optional Features:
- Resist automatic feeding system
- Auto feeding arm
- Hot Plate (HOT PLATE)
- The back wash system
- Waste recovering container device