单轨全自动曝光机
/AA單軌全自動曝光機.jpg)
/A單軌全自動曝光機1.jpg)
单轨全自动曝光机
基本规格：
适用基板尺寸 :
- 半导体/微机电/发光二极体/被动元件(Semiconductor/MEMS/LED/Passive Component)
- 触控面板/显示器(Touch Panel/Display Panel)
- 适用尺寸：substrate size2”~8”、8”~12”
- Fully Auto Alignment
- Auto Loading /Unloading
- Light Source
- Exposure light source：350W, 500W, 1000W, 2000W
- Exposure area：6”~12”
- Uniformity：≧3% to ≦5%
- Alignment System
- Alignment Accuracy：±1um
- Alignment Target：Customer designed
- X axis range：±70mm
- Y axis range：±15mm
- Z axis range：±10mm
- Exposure Gap：up to 1000um
- Gap Adjustment Resolution：1um
- Alignment Stage
- X axis range：±5mm
- Y axis range：±5mm
- θ axis range：±3°
- Axis resolution：0.1um
- Wafer Handing
- Robot Handing
- Wafer Size：2”~200mm
- Throughput：＞105wph
- High precision prealigner