Optical equipment ─ Aligner, Coater, Photo Mask, Parallel light, high sensitivity CCD camera
M&R Nano Technology Co., Ltd pursues execellent quality products in semiconductor and nano technology fields. We provide Photo Mask Aliner Machines, UV Parallel Light, Photoresist Coating Machine, Developing Machine, Photo Mask (4 to 32 inches), and other related products. Our customers vary from universities, R&D centers to manufacturers. They also come from whole the world such as Japan, Singapore, China in Asia, European countries and U.S. We are developing the next generation of semiconductor testing equipments in order to become an expert regarding optical manufacturing equipments and resistant materials.