
Patent Expertise
Design Patent
M&R has always adhered to independent research and development and technological innovation, accumulating profound technical expertise in the field of semiconductor photolithography equipment. To provide buyers with more competitive and lower-risk procurement options, we have continuously obtained numerous key patent certifications for core equipment such as exposure machines, coating machines, and cleaning devices.
- Design Patents
- Leveling mechanism of universal positioning device for exposure machine
- Auxiliary alignment device with coaxial light source
- Wafer exposure machine
- Photoresist coating machine with heat-insulating structure
- Photoresist coating machine with heat-insulating structure
- Optical structure of light-transmitting aligner
- Rotational synchronous edge-finding surface cleaning device
- Wafer positioning device for coating machine
- Integrated alignment mechanism and exposure alignment device with such mechanism
- Automatic leveling mechanism for horizontal and pitch angles of wafer edge and photomask for wedge error compensation in exposure machine - Novel
- Automatic leveling mechanism for horizontal and pitch angles of wafer edge and photomask for wedge error compensation in exposure machine - Invention
- Optical device of exposure machine
- Light plate heat dissipation device for exposure machine