M&R specializes in the design, modification, and integration of key equipment modules in the photolithography segment, encompassing:
Photoresist Processing Systems:
Customized coating and developing machines for UV photoresist, multi-patterned materials, and various substrates to improve film thickness uniformity and reduce defects.
Precision Lithography Systems:
Focused on improving the overlay accuracy and yield of existing exposure machines. Services include upgrading alignment mark detection systems to optimize on-product overlay; calibrating wafer transport systems to improve uptime per inch (UPH); and implementing real-time dose monitoring and APC integration to achieve data-driven process optimization and stable control.
Temperature Control System:
Through multi-point in-situ thermocoupled measurement and mapping, the heater zone power modulation is recalibrated, significantly improving wafer-level temperature uniformity, ensuring the consistency of chemical amplification photoresist reactions, and directly improving the uniformity of critical dimensions.

Technical Advantages:

• Precision-oriented, supporting submicron-level CD and stack-up control.
• Solving challenges in specialized applications such as 3D IC, wafer-level packaging, silicon photonics, and MEMS.
• Modular design and seamless integration with MES/EAP ensure stable mass production and yield monitoring.

Driven by Moore's Law and beyond, we are committed to becoming your process technology partner, providing customized photolithography equipment services that exceed standard specifications, helping you overcome process bottlenecks and enhance your competitiveness.