Automatic Developer | M&R NANO TECHNOLOGY Semiconductor & Optoelectronic Process Equipment
Fully automated developing machines are highly integrated advanced systems designed with SEMI-compliant communication architecture and real-time monitoring capabilities. They enable seamless integration with upstream and downstream processes, supporting full production line automation and digital management. Automated robotic arms perform precise wafer loading and unloading, while the positioning system ensures accurate alignment throughout the process. In addition, the tray system incorporates acid-resistant materials, vacuum adhesion, and chemical-proof design to ensure high process accuracy, operational safety, and long-term reliability. Choose M&R NANO TECHNOLOGY for high-quality semiconductor & optoelectronic process equipment and reliable customized manufacturing.
Automatic Developer
Fully automated developing machines are highly integrated advanced systems designed with SEMI-compliant communication architecture and real-time monitoring capabilities. They enable seamless integration with upstream and downstream processes, supporting full production line automation and digital management. Automated robotic arms perform precise wafer loading and unloading, while the positioning system ensures accurate alignment throughout the process. In addition, the tray system incorporates acid-resistant materials, vacuum adhesion, and chemical-proof design to ensure high process accuracy, operational safety, and long-term reliability.
Equipment Features
Equipment features include high-uniformity jet developing technology, an automatic chemical compensation system, closed-loop time and flow control, a sealed clean chamber, a chemically resistant structure, and modular design supporting multiple wafer sizes.
Advantages of M&R's Fully Automatic Developer
M&R's Fully Automatic Developer is renowned for its high stability, strong compatibility, and comprehensive customization capabilities, making it a particularly competitive piece of equipment in mass production and high-consistency R&D environments. Its greatest benefit lies in ensuring that each wafer is processed under identical conditions through a fully automated process from wafer feeding, developing, washing, drying to wafer exit, significantly improving process consistency and yield. For customers requiring strict linewidth control and low defect rates, this effectively shortens process calibration time and reduces labor costs.
M&R offers broad photoresist compatibility, allowing for adjustments to jet angle, developing dynamics, and flow rate parameters to suit customer process characteristics—a level of customization unmatched by many domestic and international equipment.
The advantages of M&R's Fully Automatic Developer include rapid implementation, customized technical support, stable supply of repair parts, more flexible costs, and mature experience in photoresist integration. Its fully automated developing machine effectively solves problems such as unstable manual developing, uneven liquid flow, excessive linewidth error, and difficulty in replicating the process. For mass production plants, MEMS manufacturing, and the optoelectronic components and sensor industry, it is the best choice that combines performance, cost, and reliability.
Specifications
- Frame: SUS housing, WPP
- Motor Specifications: AC Servo Motor
- Motor Speed: 10-6000 RPM, with low-speed paddle
- Speed Accuracy: Constant speed +/-1%
- Nozzle Mechanism: 3 sets of liquid spray nozzles, on-arm spray nozzle module
- Applicable Wafer Size: 2”-8”
- Pad Mechanism: Ceramic/acid and alkali resistant, 45-degree chamfer to prevent PR penetration
- Pad Flatness: <10um
- Robot Arm Configuration: Dual-arm conveyor module
- Operation Method: Automatic arm feeding
- Control System: X-Y axis moving arm, PLC + Touch Panel, industrial control module (IPC + IO), 100 configurable recipe modules
- Safety Devices: EMO emergency stop/buzzer, automatic operation safety protection, pad vacuum leakage protection, vacuum detection
Configuration
- Spindle rotary motor
- Plate bearing mechanism
- Control system
- Safety devices
- Liquid/pneumatic bearing system
- Robotic arm
- Wafer positioning architecture
Options
- SEMI Equipment Communication Architecture
- Real-time Monitoring System
Applications
- Suitable for high-volume production environments of 2-inch to 8-inch wafers or substrates.
- Widely used in semiconductor manufacturing, optoelectronics, MEMS, and precision lithography processes.
- Especially critical for mass production and quality control on production lines.
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Automatic Developer Professional Custom Semiconductor & Optoelectronic Process Equipment
M&R NANO TECHNOLOGY provides high-quality Automatic Developer and semiconductor & optoelectronic process equipment designed for advanced semiconductor, optoelectronic, and testing applications. Our product line includes detailed Mask Aligners, Spin Coaters, and Developers manufactured in our Taoyuan, Taiwan facility with strong automation capabilities.
We focus on delivering stable quality and precise customization through our in-house R&D and miniaturization technology. This ensures that every system meets strict process requirements while maintaining practical durability, low cost, and high efficiency for end-users.
For global buyers, M&R NANO TECHNOLOGY offers dependable manufacturing support that simplifies the sourcing process. We provide responsive communication, efficient automation integration, and consistent after-sales maintenance to help customers successfully bring their semiconductor & optoelectronic process equipment into production.