Etching Equipment
M&R’s etching equipment is manufactured using corrosion-resistant materials such as PP, PVDF, and PFA, and is configured with multiple process tanks, including QDR tanks, chemical tanks, heating modules, O.F tanks, and HF/SC1 tanks, allowing flexible configuration to meet different process requirements.
The system also includes a DI water rinsing tank and an N₂ drying spray gun. Tank sizes can be customized to support various wafer dimensions, with optional chemical heating and circulation filtration systems available.
The control system utilizes a PLC controller combined with an HMI (Human-Machine Interface), enabling real-time monitoring and display of abnormal conditions at the operator interface. Recipe management and automated operation can be configured as options. To ensure operational safety, the equipment is equipped with a positive-pressure control cabinet to prevent acid gas corrosion, leakage circuit protection, over-temperature and overload protection, bottom leak detection, waste liquid and exhaust extraction, abnormal liquid level detection, and an EMO (Emergency Off) system. A CO₂ fire extinguishing system is also available as an optional safety feature.
Specifications
- Frame: SUS shell, WPP
- Acid supply, circulation, and drainage system.
- Interlock function
- Tank temperature control function
- Water resistance meter function
- Drying mechanism function
- Ventilation system
- Waste liquid discharge system
Configuration
- Corrosion-resistant tank
- Emergency MO stop
- Leak detection
- Waste liquid and exhaust gas emission system
- N2 spray gun drying
- FFU (Fan Filter Unit)
- Yellow light illumination
- Tri-color warning lights
Options
- CO2 fire suppression system
- Ultrasonic oscillator function
- UPS uninterruptible power supply system
- Static electricity elimination system
- Automatic liquid replenishment system
- SECS/GEM communication protocol
Applications
- Light-emitting diodes (LEDs)
- LEDs
- Semiconductors
- Micro-electromechanical systems (MEMS)
- Passive components
- Precision electronic components
Etching Equipment Professional Custom Semiconductor & Optoelectronic Process Equipment
M&R NANO TECHNOLOGY provides high-quality Etching Equipment and semiconductor & optoelectronic process equipment designed for advanced semiconductor, optoelectronic, and testing applications. Our product line includes detailed Mask Aligners, Spin Coaters, and Developers manufactured in our Taoyuan, Taiwan facility with strong automation capabilities.
We focus on delivering stable quality and precise customization through our in-house R&D and miniaturization technology. This ensures that every system meets strict process requirements while maintaining practical durability, low cost, and high efficiency for end-users.
For global buyers, M&R NANO TECHNOLOGY offers dependable manufacturing support that simplifies the sourcing process. We provide responsive communication, efficient automation integration, and consistent after-sales maintenance to help customers successfully bring their semiconductor & optoelectronic process equipment into production.

