i-line Stepper | M&R NANO TECHNOLOGY Semiconductor & Optoelectronic Process Equipment

An i-line stepper is a photolithography device that uses a 365nm wavelength light source for exposure, primarily used in micron-level resolution semiconductor processes and in MEMS, power devices, and other fields. Its advantages include high stability and low cost, making it suitable for mature processes and thick photoresist applications.
The i-line stepper achieves high-precision pattern transfer by projecting a scaled-down circuit pattern from a mask onto the surface of a photoresist-coated wafer. The resolution of an i-line stepper is typically around 350nm, suitable for mature processes and micron-level structure fabrication. Due to the longer wavelength of the light source used, the i-line system exhibits excellent performance in terms of photoresist thickness and wafer warpage tolerance, making it particularly suitable for thick photoresist processes and compound semiconductor wafers with significant warpage, such as SiC and GaN. The equipment is equipped with an autofocus, multi-point leveling, and high-precision alignment system to ensure exposure quality and the accuracy of multi-layer pattern overlap. Compared to advanced deep ultraviolet lithography equipment, i-line steppers are less expensive, more stable in operation, and easier to maintain, making them suitable for low-to-medium resolution requirements and high-volume production applications. In addition, i-line steppers are also frequently used in education and R&D fields due to their lower price and lower operating threshold. Overall, i-line steppers continue to play an important role in mature manufacturing processes, and are particularly suitable for applications such as power devices, MEMS, and sensors. Choose M&R NANO TECHNOLOGY for high-quality semiconductor & optoelectronic process equipment and reliable customized manufacturing.